Flying plasmonic lens in the near field for high-speed nanolithography
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| Audience/Grade: | High School Junior -Professional Development 11-Professional Development |
| Discipline(s): |
Manufacturing Engineering Mechanical Engineering Nanotechnology |
| Special Topic(s): | |
| Learning Resource Type: |
Teaching - Lecture/Presentation |
| Media Type: |
Audio |
| Author(s): |
Organization:SINAM |
| Description: | In order to leverage the dramatic advancements in nano-scale science and engineering, there is an urgent need for high-throughput nano-fabrication technologies that are versatile to frequent design changes. Commonly used direct-writing nano-lithography methods, such as electron-beam, focused ion-beam and scanning-probe lithography, can provide the desired flexibility without using expansive and time-consuming photo-masks, but prove to be rather limited by their throughput, mainly due to their slow scanning capabilities. |
| Rating: | No Rating |
| Related Resources | |
| Keywords: | Flying Plasmonic Lens High-speed Nanolithography |
| Version Info | |
| Publication Date: | June 2008 |
| Platform/Format: |
WWW |
| Cost: |
Free |
| Download URL: | http://sinam.org/pdf/UCB_NSEC_0751621_nanoplasmonic%20lithography |
| Metadata: |
IEEE LOM Record |
| Collection: |
SINAM
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